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Designed for unique cleaning requirements of semiconductor industries.

Vapor Vac SS

Designed for the unique cleaning requirements of the semiconductor industry, this machine captures superfine particles and prevents worker exposure to gases such as arsine, phosphine and chlorinated solvents released during the cleaning of process equipment such as molecular beam epitaxy chambers, ion implanters, and plasma etching machines.

Features » 2-1/4 gallon paper bag
» Built-in activated carbon filtration
» Downstream HEPA or ULPA filter available
» Safety latches add security

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